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Works by New York painter and printmaker Richard Polsky will be exhibited Aug. 28-Oct. 13 at the Richard A. and Rissa W. Grossman Gallery, Williams Visual Arts Building, 243 North Third Street.
A reception for the artist will be held 5-7 p.m. Friday, Sept. 7 at the Grossman Gallery.
Polsky will give a lecture 4:15 p.m. Monday, Sept. 24 at the Williams Center for the Arts on High Street. Later that day, he will lead a painting workshop for high school students through the Community-Based Teaching Program from 6:30-8:30 p.m. at the Williams Visual Arts Building.
Early in his artistic career, Polsky’s interest was piqued by advances in physics, which allowed the mapping of elusive particles to be captured on film. These images of lines moving through space on a non-delineated field were the genesis of Polsky’s three-decade career of two-dimensional abstraction.
Polsky uses various materials for his abstract compositions, from acrylic paint on canvas to works on handmade paper to sandblasted glass. “Polsky divides canvases and paper alike by way of organic lines which separate color fields,” says Jim Toia, director of community-based teaching. “These compositional elements vary from dense fields of matter to open impressions of vast space. His interest in the physical is also marked by a willingness to experiment with a wide variety of materials, from handmade paper and various painting media to etched glass.”
An advocate for disadvantaged children, Polsky also works with his son, who runs an enrichment program for Harlem youths.